JPS60262005A - 膜厚計測方法 - Google Patents

膜厚計測方法

Info

Publication number
JPS60262005A
JPS60262005A JP59118818A JP11881884A JPS60262005A JP S60262005 A JPS60262005 A JP S60262005A JP 59118818 A JP59118818 A JP 59118818A JP 11881884 A JP11881884 A JP 11881884A JP S60262005 A JPS60262005 A JP S60262005A
Authority
JP
Japan
Prior art keywords
thin film
anode
specimen
thickness
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59118818A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0376841B2 (en]
Inventor
Masayuki Uda
応之 宇田
Fumiaki Kirihata
桐畑　文明
Sukenori Shirohashi
白橋　典範
Hiroshi Ishida
博志 石田
Shinji Marutani
新治 丸谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP59118818A priority Critical patent/JPS60262005A/ja
Publication of JPS60262005A publication Critical patent/JPS60262005A/ja
Publication of JPH0376841B2 publication Critical patent/JPH0376841B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP59118818A 1984-06-09 1984-06-09 膜厚計測方法 Granted JPS60262005A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59118818A JPS60262005A (ja) 1984-06-09 1984-06-09 膜厚計測方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59118818A JPS60262005A (ja) 1984-06-09 1984-06-09 膜厚計測方法

Publications (2)

Publication Number Publication Date
JPS60262005A true JPS60262005A (ja) 1985-12-25
JPH0376841B2 JPH0376841B2 (en]) 1991-12-06

Family

ID=14745895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59118818A Granted JPS60262005A (ja) 1984-06-09 1984-06-09 膜厚計測方法

Country Status (1)

Country Link
JP (1) JPS60262005A (en])

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104309U (en]) * 1984-12-14 1986-07-02
JPS6437688U (en]) * 1987-08-31 1989-03-07
JPS6437689U (en]) * 1987-08-31 1989-03-07
US4823368A (en) * 1987-06-30 1989-04-18 Rikagaku Kenkyujyo Open counter for low energy electron detection with suppressed background noise
JPH03202709A (ja) * 1989-12-28 1991-09-04 Showa Alum Corp アルミニウム箔表面の圧延油付着量測定方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104309U (en]) * 1984-12-14 1986-07-02
US4823368A (en) * 1987-06-30 1989-04-18 Rikagaku Kenkyujyo Open counter for low energy electron detection with suppressed background noise
JPS6437688U (en]) * 1987-08-31 1989-03-07
JPS6437689U (en]) * 1987-08-31 1989-03-07
JPH03202709A (ja) * 1989-12-28 1991-09-04 Showa Alum Corp アルミニウム箔表面の圧延油付着量測定方法

Also Published As

Publication number Publication date
JPH0376841B2 (en]) 1991-12-06

Similar Documents

Publication Publication Date Title
WO2008155560A1 (en) Method for quantitative analysis of a material
Jbara et al. Surface potential measurements of electron-irradiated insulators using backscattered and secondary electron spectra from an electrostatic toroidal spectrometer adapted for scanning electron microscope applications
Graczyk et al. Scanning electron diffraction attachment with electron energy filtering
JPS60262005A (ja) 膜厚計測方法
Goff Ion scattering spectrometry
Harris et al. Drift velocities of electrons in sulphur hexafluoride
EP1012587B1 (en) Charged particle analysis
US7205539B1 (en) Sample charging control in charged-particle systems
JP3481031B2 (ja) 二重円筒形オープンカウンター
Lifshin et al. X-ray spectral measurement and interpretation
JPH0556459B2 (en])
US20110233398A1 (en) Method for characterisation of dielectric layers by ultraviolent photo-emission spectroscopy
JPH0556460B2 (en])
Gruzza et al. The transmission of the electron analyzers determined by elastic peak electron spectroscopy
JPH063295A (ja) 表面分析装置
Carriveau et al. Charge of ions emitting spectral lines
CN110988975B (zh) 一种mv级电压峰值测量探头及其制作方法
Chase et al. Measurement of low energy secondary electron distributions using a double-pass cylindrical mirror analyzer
Hasegawa et al. Nondestructive depth profile analysis by changing escape depth of photoelectrons
JP3172567B2 (ja) 低エネルギー電子分光を用いて炭化水素膜の光学バンドギャップを測定する方法
JPS61239554A (ja) 電位測定装置
Statham The efficiency of Si (Li) detectors at very low photon energies
JPH0376842B2 (en])
Yost et al. A quality monitor and monitoring technique employing optically stimulated electron emission
JPS63308510A (ja) 荷電ビ−ム測長法および測長装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term